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Mask Complexity, Cost, And Change
Summary by Semiconductor Engineering
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Mask Complexity, Cost, And Change
Experts at the Table: As leading-edge lithography nodes push further into EUV and beyond, mask-making has become one of the most critical and costly aspects of semiconductor manufacturing. At the same time, non-EUV applications are stretching the lifetime of older tools and processes, challenging the industry to find new solutions for both ends of the spectrum. Semiconductor Engineering sat down to discuss these changes with Harry Levinson, prin…
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