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SK Hynix Introduces Industry's First Commercial High NA EUV
- SK Hynix has assembled the industry's first High NA EUV lithography system for mass production at the M16 fabrication plant in Icheon, South Korea.
- The TWINSCAN EXE:5200B can print transistors 1.7 times smaller and achieve transistor densities 2.9 times higher than existing EUV systems.
- This technology is essential for advancing the semiconductor industry and enhancing leadership in the artificial intelligence memory market.
- The High NA EUV lithography system is now installed at SK Hynix's main production base in Icheon, South Korea.
51 Articles
51 Articles
The Korea Times
연합뉴스-Yonhap News AgencySK hynix adopts next-generation ASML production equipment for DRAM
Korea's No. 2 chipmaker SK hynix said Wednesday it has adopted advanced production equipment at a domestic memory production line to accelerate the development of next-generation chips. The company said it has installed the industry's first High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography system at its M16 chip fabrication plant, located at its main production base in Icheon, south of Seoul. High NA EUV refers to an advanced…
SK hynix introduces ‘industry’s first’ commercial High NA EUV
The TWINSCAN EXE:5200B, the first model for volume production of ASML’s High NA EUV product line, enables printing of transistors 1.7 times smaller and achievement of transistor densities 2.9 times higher, compared with the existing EUV system, with a 40% improvement in the NA to 0.55 from 0.33.
For two decades, the European ASML has travelled a titanic path that took it from the 65 nanometers back in 2003 to the equipment capable of printing chips below 3 nm in 2023. Now, the company has published key data in terms of technology, R & D and costs, where in that journey more than 40 billion dollars were left and twenty years of research and improvement were needed. Faced with that evolution, the Chinese semiconductor industry is still st…
SK hynix Introduces Commercial High NA EUV Lithography System
Seoul, September 3, 2025 – SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme ultraviolet lithography (NA EUV) lithography system for mass production at the M16 fabrication plant in Icheon, South Korea. The company described High NA EUV as a next-generation lithography system that designed […] The post SK hynix Introduces Commercial High NA EUV Lithography System appeared first …
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