Researchers suggest a new four-step process to pattern solution-processable OLED emitter layers without UV radiation or etching

Researchers suggest a new four-step process to pattern solution-processable OLED emitter layers without UV radiation or etching

Researchers from Sogang University, the Ulsan National Institute, Hanyang University, and Yonsei University developed an indirect method for photopatterning of solution-processed OLED emitter layers (EML). The new method does not involve any direct exposure to UV radiation or harsh etching processes.  The new process starts by forming a sacrificial photoresist (PR) pattern, followed by spin-coating of the EML film. The next step involves convert…