Intel and ASML Push High NA EUV Toward Wider Production

Intel Foundry and ASML report High NA EUV production milestone

Intel Foundry and ASML have reported continued progress in High NA EUV lithography production, including more than one million wafers processed to date across early tool certification and testing, research and development, and volume production on select layers of Intel's Panther Lake processors — part of the Core Ultra Series 3 family.

Intel and ASML push High NA EUV toward wider production

Intel Foundry and ASML are stepping up efforts to move High Numerical Aperture (High NA) EUV lithography deeper into semiconductor manufacturing, highlighting production progress and plans for larger mask formats. The companies presented the latest developments this week at the SPIE Photomask Technology + Extreme Ultraviolet Lithography conference in Monterey, California. For eeNews Europe readers, […] The post Intel and ASML push High NA EUV to…

Intel surpasses one million High-NA EUV wafers processed, outpaces the rest of the industry combined — company also trailblazing giant 6×12 photomasks to speed production and lower costs

Intel announced on Monday that it had processed more than one million 300-mm wafers using its High-NA EUV scanners, less than two and a half years after its first tool was assembled. For now, the company intends to use industry-standard 6-inch photomasks, which can expose 26×16.5 mm half-fields and therefore require field stitching for larger chips. However, Intel is also working on larger 6×12-inch photomasks that would enable High-NA EUV scann…